Resumo

GUTIERREZ, César  e  PILCO, Alex. Optimization of the removal of persistent organic compounds through the photo-fenton process. Rev. Soc. Quím. Perú [online]. 2020, vol.86, n.1, pp.58-69. ISSN 1810-634X.  http://dx.doi.org/10.37761/rsqp.v86i1.273.

The response surface methodology was applied to evaluate the optimal experimental conditions to remove persistent organic compounds from a synthetic textile wastewater using a batch photochemical reactor on a laboratory scale. Four factors at three levels were studied: Fenton H2O2/Fe2+ reagent ratio 11,25, 18,75, 26,25 mg/L/mg/L, UV lamp power 4, 11,18 W, pH 2, 3, 4 and treatment time 60, 120, 180 min. The optimum levels found for the four factors were: ratio of Fenton H2O2/Fe2+ reagents equal to 17 mg/L/mg/L, UV lamp power equal to 4 W, pH equal to 3 and treatment time of 180 min. It was found that the photo- Fenton process is very effective in treating synthetic textile wastewater, with a removal of 86%, with respect to COD.

Palavras-chave : Photo-Fenton; textile wastewater; experiment design; chemical oxygen demand.

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